Web光刻胶(Photoresist简称PR)又称光致抗蚀剂,它是一种对光敏感的有机化合物,它受紫外光曝光后,在显影液的溶解度会发生变化。①光刻胶作用:将掩膜板上的图形转移到晶圆表面顶层的光刻胶中;在后续工序中,保护下面的材料(刻蚀或离子注入)。②光刻胶的成分树脂:光刻树脂是一种惰性的 ... WebDuoClean® PowerFins™ with Self-Cleaning Brushroll Powered Lift-Away® Upright Vacuum AZ1500 Series OWNER’S GUIDE POWERFINS™ with Self-Cleaning Brushroll
光刻胶AZ5214 AZ4620 AZ9260 AZ1500 AZ4330安智AZ系列进口 …
WebTop: AZ1500 4.4cp, ~ 500nm. Bottom: PMGI SF6 ~ 250 nm. Sub: Silicon substrate. I am trying to follow a recipe where I do the following. 1. AZ-Developer:DI = 1:1, room temp, 3 mins (longer than ... WebAZ1500 series –Recommended Process Parameters Process AZ1505 AZ1512 AZ1518 Dehydration Bake temp (°C) 150 150 150 (hot plate) time (min) 3 3 3 HMDS time (min) 3 3 3 (vapor) Spin coating speed (rpm) 3000 3000 3000 acceleration (rpm/s) 3000 3000 3000 time (s) 30 30 30 Soft-bake temp (°C) 80 100 120 (hot plate) town marshall definition vs sheriff
Photoresists AZ 1500 Series AZ 1505 AZ 1512HS AZ 1514H AZ 1518 …
WebSU-8光刻胶的优点:. 1、SU-8光刻胶在近紫外光 (365nm- 400nm)范围内光吸收度很低,且整个光刻胶层所获得的曝光量均匀一致,可得到具有垂直侧壁和高深宽比的厚膜图形;. 2、SU-8光刻胶具有良好的力学性能、抗化学腐蚀性和热稳定性;. 3、SU-8在受到紫外辐射后发 … WebPHYSICAL and CHEMICAL PROPERTIES AZ 1505 1518 1529 1514H 1512HS 1518HS Solids content [%] 17.7 29.9 34.0 27.8 26.5 30.4 Viscosity [cSt at 25°C] 6.3 34.2 80.0 … Web1) 高感光度,高产出率. 2) 高附着性,特别为湿法刻蚀工艺改进. 3) 广泛应用于全球半导体行业. 1) Achievement for high sensitivity and high throughput. 2) Improvement for wet etching … town marriott